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National Repository of Grey Literature 4 records found  Search took 0.01 seconds. 
Electrotransport properties of the nanostructures fabricated by the FIB
 Ostřížek, Petr ; Kolíbalová, Eva (referee) ; Urbánek, Michal (advisor)
The aim of this work is fabrication of nanostructures and measurement of their electrotransport properties. There are two different methods used for fabrication - electron beam lithography with sputtering of thin films and focused ion beam with deposition from gas phase. I-V characteristic was measured for characterisation of as prepared nanostructures - wires. Material of wires prepared by using of electron beam lithography was permalloy - an alloy of iron and nickel. Second types of wires prepared by using of chemical vapor deposition induced by focused ion beam was platinum based.
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SMV-2016-04: Research and development of 100 kV high voltage power supply
 Zobač, Martin ; Vlček, Ivan
The project deals with research and development of high voltage power supply for particle optics accelerator with integrated power supply for FEG. The supply is intended for electron lithography and for TEM.
Detailed record
Electrotransport properties of the nanostructures fabricated by the FIB
 Ostřížek, Petr ; Kolíbalová, Eva (referee) ; Urbánek, Michal (advisor)
The aim of this work is fabrication of nanostructures and measurement of their electrotransport properties. There are two different methods used for fabrication - electron beam lithography with sputtering of thin films and focused ion beam with deposition from gas phase. I-V characteristic was measured for characterisation of as prepared nanostructures - wires. Material of wires prepared by using of electron beam lithography was permalloy - an alloy of iron and nickel. Second types of wires prepared by using of chemical vapor deposition induced by focused ion beam was platinum based.
Detailed record
Multi-level diffraction structures for optical active elements
 Daněk, Lukáš
The work concerns with creation of multi-level diffraction structures by electron lithography. It is focused mainly on elimination of the influence of proximity of surrounding expositions known also as the 'proximity effect'.
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